发明名称 RADIATION-SENSITIVE POLYORGANOSILOXANE, METHOD FOR PRODUCING THE SAME AND LIQUID CRYSTAL ALIGNING AGENT
摘要 PURPOSE: Radiation-sensitive polyorganosiloxane is provided to be conveniently manufactured using a stable raw material and to obtain a liquid crystal alignment film having a good expression property of a pretilt angle when the polyorganosiloxane is applied to a liquid crystal alignment agent. CONSTITUTION: Radiation-sensitive polyorganosiloxane has a structure which is marked by chemical formula 3. In chemical formula 3, R is hydrogen or a methyl group and n is an integer of 1-10. R^1 is a group which is marked by chemical formula (R1-1) and R^2 is fluorine or a cyano group. In chemical formula (R1-1), R^I is an alkyl group having a carbon number of 1-40 or a monovalent hydrocarbon group having a carbon number of 3-40.
申请公布号 KR20100092390(A) 申请公布日期 2010.08.20
申请号 KR20100012779 申请日期 2010.02.11
申请人 JSR CORPORATION 发明人 AKIIKE TOSHIYUKI;NAKATA SHOUICHI
分类号 C08G77/04;C08G77/22;C08L83/04;C09K19/56 主分类号 C08G77/04
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