发明名称 |
RADIATION-SENSITIVE POLYORGANOSILOXANE, METHOD FOR PRODUCING THE SAME AND LIQUID CRYSTAL ALIGNING AGENT |
摘要 |
PURPOSE: Radiation-sensitive polyorganosiloxane is provided to be conveniently manufactured using a stable raw material and to obtain a liquid crystal alignment film having a good expression property of a pretilt angle when the polyorganosiloxane is applied to a liquid crystal alignment agent. CONSTITUTION: Radiation-sensitive polyorganosiloxane has a structure which is marked by chemical formula 3. In chemical formula 3, R is hydrogen or a methyl group and n is an integer of 1-10. R^1 is a group which is marked by chemical formula (R1-1) and R^2 is fluorine or a cyano group. In chemical formula (R1-1), R^I is an alkyl group having a carbon number of 1-40 or a monovalent hydrocarbon group having a carbon number of 3-40.
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申请公布号 |
KR20100092390(A) |
申请公布日期 |
2010.08.20 |
申请号 |
KR20100012779 |
申请日期 |
2010.02.11 |
申请人 |
JSR CORPORATION |
发明人 |
AKIIKE TOSHIYUKI;NAKATA SHOUICHI |
分类号 |
C08G77/04;C08G77/22;C08L83/04;C09K19/56 |
主分类号 |
C08G77/04 |
代理机构 |
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主权项 |
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地址 |
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