| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and a method for substantially eliminating reticle slippage during the movement of a reticle stage. <P>SOLUTION: The system includes a mask holding system, a mask force device and a support transport device. The mask holding system includes a support device and a holding device, wherein the holding device releasably couples a mask, e.g. a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask so that a projection optical system in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of a substrate by using a radiation beam. The support transport device is coupled to the mask support device and moves the mask support device concurrently with the mask force device. <P>COPYRIGHT: (C)2010,JPO&INPIT |
