发明名称 METHOD OF MANUFACTURING ELECTROOPTICAL APPARATUS
摘要 PROBLEM TO BE SOLVED: To enhance the external shape accuracy of an electrooptical apparatus, including a liquid crystal device, and to improve the yield, for example. SOLUTION: This method of manufacturing the electrooptical apparatus includes a first process of cutting a second substrate along a first external shape line, by applying a first dicing processing along a first external outer shape line (Xj) so as to form a notch part (1223v) in the inner surface of the first substrate facing an electrooptical layer of the first substrate (210) through the second substrate from the outer surface (220a) side of the second substrate that does not face the electrooptical layer (50) of the second substrate (220). This method also includes a second process of, after the first process, forming a first scribe groove by applying first scribe processing along the first outer shape line, to the outer surface (210a) of the first substrate that does not face the electrooptical layer of the first substrate, and applying first break processing to the first substrate from the first scribe groove as a start point, thereby cutting the first substrate along the first outer shape line. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010181696(A) 申请公布日期 2010.08.19
申请号 JP20090025906 申请日期 2009.02.06
申请人 SEIKO EPSON CORP 发明人 ISHIKAWA TOMOYA;TANI TOSHIKI;MIYASHITA SHINICHI
分类号 G09F9/00;G02F1/13;G02F1/1333;G02F1/1339;G02F1/1368 主分类号 G09F9/00
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