发明名称 |
APPARATUS AND METHOD FOR SUPPLYING HYDROGEN GAS, AND QUARTZ GLASS MANUFACTURING APPARATUS |
摘要 |
There is provided an apparatus for supplying a hydrogen gas to a quartz glass manufacturing apparatus including a burner that generates an oxyhydrogen flame when supplied with the hydrogen gas, where the apparatus includes: a first hydrogen supply system that supplies a hydrogen gas in which isotopes are in equilibrium; a second hydrogen supply system that supplies a hydrogen gas in which isotopes are out of equilibrium; a flow rate control section that includes: a valve that changes a flow rate of the hydrogen gas to be supplied to the burner; a first flow rate measuring section that measures the flow rate of the hydrogen gas to be supplied to the burner by measuring a heat capacity; and a control section that controls the valve in such a manner that a measured value obtained by the first flow rate measuring section approaches a set value input from outside; a second flow rate measuring section that measures the flow rate of the hydrogen gas to be supplied to the burner by measuring a different factor than the heat capacity; and a set value compensating section that compensates the set value by multiplying the set value by a ratio between the measured value obtained by the first flow rate measuring section and a measured value obtained by the second flow rate measuring section.
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申请公布号 |
US2010209859(A1) |
申请公布日期 |
2010.08.19 |
申请号 |
US20100706646 |
申请日期 |
2010.02.16 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
INOUE DAI;NAGAO TAKAAKI;KOIDE HIROYUKI |
分类号 |
F23N1/00 |
主分类号 |
F23N1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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