METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES
摘要
A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.
申请公布号
WO2009113063(A3)
申请公布日期
2010.08.19
申请号
WO2009IL00269
申请日期
2009.03.10
申请人
YEDA RESEARCH & DEVELOPMENT COMPANY LTD. N;NAAMAN, RON;GOLAN, BEN;FRADKLIN, ZEEV;WINKLEMAN, ADAM;ORON, DAN
发明人
NAAMAN, RON;GOLAN, BEN;FRADKLIN, ZEEV;WINKLEMAN, ADAM;ORON, DAN