发明名称 ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR IMMERSION LITHOGRAPHY APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an environmental system for controlling an environment in a gap between an optical assembly and a device. <P>SOLUTION: In the environmental system, a fluid barrier (254) is arranged near a device (30), and an immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). An immersion fluid system (252) collects the immersion fluid (248) present directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet arranged near the device (30), and the immersion fluid system (252) can include a low-pressure source communicating with the scavenge inlet. The environmental system (26) includes a bearing fluid source that directs a bearing fluid between the fluid barrier (254) and the device (30), to support the fluid barrier (254) to the device (30). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010183085(A) 申请公布日期 2010.08.19
申请号 JP20100026002 申请日期 2010.02.08
申请人 NIKON CORP 发明人 HAZELTON ANDREW J;SOGARD MICHAEL
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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