发明名称 |
MARK ARRANGEMENT INSPECTING METHOD, MASK DATA, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
摘要 |
A method of inspecting a mark arrangement according to an embodiment of the present invention includes: generating mask data in which mark seed data that includes an inspection mark that includes vector information and is not drawn on a mask and mark data is arranged on a scribe line of the mask, calculating coordinates of the inspection mark from a reference position of the mark seed data, detecting an arrangement state of the inspection mark with respect to the reference position by using the coordinates and vector information, and judging whether the mark seed data is correctly arranged by comparing the arrangement state of the inspection mark with an arrangement check rule.
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申请公布号 |
US2010211352(A1) |
申请公布日期 |
2010.08.19 |
申请号 |
US20090649477 |
申请日期 |
2009.12.30 |
申请人 |
MORINAGA HIROYUKI;ISHIGO KAZUTAKA;KUMANOMIDO TAKAKI |
发明人 |
MORINAGA HIROYUKI;ISHIGO KAZUTAKA;KUMANOMIDO TAKAKI |
分类号 |
G06F15/00;G03F1/38;G03F1/44;G06F17/50;H01L21/30 |
主分类号 |
G06F15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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