| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which suppresses abnormal discharge in a gas hole part, thereby preventing damage of a sample table caused by the abnormal discharge, and has the high reliability and stability of the device. SOLUTION: In the plasma processing apparatus including a vacuum chamber, a sample table for mounting a member to be processed thereon, the sample table having a coolant path to control a temperature of the member to be processed, an electrostatic sucking power supply for electrostatically sucking the member to be processed on the sample table, and a plurality of gas hole parts provided in the sample table to supply heat transfer gas between the member to be processed and the sample table and thereby control a temperature of the member to be processed, each of the gas hole parts includes a boss formed of a dielectric, a sleeve, and a plurality of small tubes, and the small tubes are arranged in a range of 10 to 50% of a radius when measured from a center of the gas hole part toward the outside. COPYRIGHT: (C)2010,JPO&INPIT |
