THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD

摘要

A thin film forming apparatus controls pressure in a first inner space in a film forming container and pressure in a second inner space provided in the first inner space such that each pressure meets predetermined pressure conditions. The apparatus generates plasma in the second inner space by having a raw material gas flow on a substrate in the second inner space and by applying high frequency power corresponding to the pressure conditions to a plasma generating source provided in the first inner space, and forms a thin film on the substrate.