| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having excellent resolution and for forming a resist pattern having a satisfactory shape, a resist pattern forming method and a polymer compound. <P>SOLUTION: The positive resist composition contains a base material component (A) whose solubility in an alkali developing liquid is increased by an action of acid and an acid generating agent component (B) generating acid by light exposure, wherein the base material component (A) contains a resin component (A1) having a constituent unit (a0) including a group represented by general formula (a0-0-1) [in formula, R<SP>1</SP>and R<SP>2</SP>each independently represents a hydrogen atom or a 1-5C lower alkyl group, Y<SP>1</SP>represents a 2-15C alkylene group which may have an ether bond and X represents a 1-20C hydrocarbon group]. <P>COPYRIGHT: (C)2010,JPO&INPIT |
