| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern inspection method suitable for inspecting easily and quickly existence of pattern irregularities of a photomask. SOLUTION: This pattern inspection method includes an irradiation step for irradiating a repeated pattern by a prescribed light flux, a Fourier transform image detection step for detecting a Fourier transform image corresponding to diffracted light generated by irradiation of the repeated pattern by the light flux, and a pattern irregularity determination step for determining existence of pattern irregularities of the photomask based on the detected Fourier transform image. In the Fourier transform image detection step, a Fourier transform image corresponding to prescribed high-order diffracted light in the diffracted light is detected so that a Fourier transform image corresponding to pattern irregularities of the photomask is spatially separated from a Fourier transform image corresponding to a normal pattern. COPYRIGHT: (C)2010,JPO&INPIT
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