发明名称 EXPOSURE HEAD AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To restrict unevenness of a light amount detected by a photosensor in a light amount correcting process in an exposure head with a plurality of rows of light-emitting elements arranged therein. <P>SOLUTION: The exposure head includes a first light-emitting element row which is set on a light-transmission substrate 220 and in which light-emitting elements 202 are arranged in a first direction, a second light-emitting element row which is different from the first light-emitting element row and in which light-emitting elements 202 are arranged in the first direction, a first photosensor 230 which is set at a first side in a second direction orthogonal to the first direction and receives the light emitted by the light-emitting elements 202 of the first light-emitting element row and the light-emitting elements 202 of the second light-emitting element row, a second photosensor 230 which is set in the second direction at a second side opposite to the first side and receives the light emitted by the light-emitting elements 202 of the first light-emitting element row and the light-emitting elements 202 of the second light-emitting element row, and an imaging optical system 205 which images the light emitted by the light-emitting elements 202. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010179464(A) 申请公布日期 2010.08.19
申请号 JP20090022219 申请日期 2009.02.03
申请人 SEIKO EPSON CORP 发明人 TANAKA HIROSHI;IKUMA TAKESHI
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/04;H04N1/036 主分类号 B41J2/44
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