发明名称 NANOWIRE MESH DEVICE AND METHOD OF FABRICATING SAME
摘要 A semiconductor structure is provided that includes a plurality of vertically stacked and vertically spaced apart semiconductor nanowires (e.g., a semiconductor nanowire mesh) located on a surface of a substrate. One end segment of each vertically stacked and vertically spaced apart semiconductor nanowires is connected to a source region and another end segment of each vertically stacked and vertically spaced apart semiconductor nanowires is connected to a drain region. A gate region including a gate dielectric and a gate conductor abuts the plurality of vertically stacked and vertically spaced apart semiconductor nanowires, and the source regions and the drain regions are self-aligned with the gate region.
申请公布号 US2010207208(A1) 申请公布日期 2010.08.19
申请号 US20090371943 申请日期 2009.02.17
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BEDELL STEPHEN W.;CHANG JOSEPHINE B.;CHANG PAUL;GUILLORN MICHAEL A.;SLEIGHT JEFFERY W.
分类号 H01L29/78;H01L21/302;H01L21/336 主分类号 H01L29/78
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