| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To stably remove a halogenated organic compound at a high removal level even if the emission treatment operation is carried out for a long period of time. <P>SOLUTION: An apparatus 10 for treating emission comprising dichloromethane includes a gas treatment column 24 comprising a DCM microorganism layer 25 in which a microorganism decomposing dichloromethane sticks to and is supported by a sticking support, a gas feeder 12 for feeding emission into the gas treatment column 24 from the lower part thereof, a spray pipe 26 for spraying water or a culture solution of the microorganism that decomposes dichloromethane, onto the DCM microorganism layer 25 from the upper part of the gas treatment column 24, and a fumigation means 23 for causing a fumigation gas comprising dichloromethane alone as a carbon component and having a higher dichloromethane concentration than the dichloromethane concentration in the emission to contact the DCM microorganism layer 25. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
