| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition satisfying demands for a wide exposure latitude, reduction of a skirt-like pattern profile, favorable pattern features and excellent dry etching durability, and allowing formation of a pattern having fewer defects after development, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin containing repeating units expressed by formulae (I), (II) and (III) and changing into soluble with an alkali developer by an action of an acid; and (B) two or more kinds of compounds generating an acid by irradiation with actinic rays or radiation. <P>COPYRIGHT: (C)2010,JPO&INPIT |
