| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask unit capable of correctly forming a mask pattern on a substrate even when a thin film substrate is used, and a vapor deposition apparatus having the mask unit. Ž<P>SOLUTION: The mask unit 100 includes a substrate placing stand 8 having a side face, a top face having an aperture part, and a bottom face with a substrate 4 being placed on the top face, a substrate holding plate 7 which is arranged in the substrate placing stand to support the substrate 4 placed on the top face via the aperture part, a vapor deposition mask 3 having a lamination structure of a first mask layer 1 and a second mask layer 2 with an aperture pattern 10 being provided thereon, while the coefficient of thermal expansion of a material of the second mask layer in contact with the substrate is larger than that of the material of the first mask layer, and a fixing tool 9 for fixing the substrate and the vapor deposition mask which are placed on the upper face of the substrate placing stand. The mask unit forms a pattern on the substrate through the aperture pattern of the vapor deposition mask, and the vapor deposition mask is heated and deformed during the vapor deposition, and tightly attached to the substrate. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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