发明名称 Ceramic and method of manufacturing the same, Dielectric capacitor, semiconductor device, and element
摘要 A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
申请公布号 US2010207492(A1) 申请公布日期 2010.08.19
申请号 US20100662617 申请日期 2010.04.26
申请人 SEIKO EPSON CORPORATION 发明人 NATORI EIJI;KIJIMA TAKESHI;FURUYAMA KOICHI;TASAKI YUZO
分类号 H01L41/187;C04B35/42;C04B35/45;C04B35/457;C04B35/465;C04B35/472;C04B35/475;C04B35/491;C04B35/493;C04B35/495;C04B35/497;C04B35/624;C23C14/08;C23C16/40;C23C18/12;H01L21/314;H01L21/316;H01L21/8246 主分类号 H01L41/187
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