发明名称 TEMPERATURE CONTROL SYSTEM FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 A temperature control system for semiconductor manufacturing equipment is disclosed, which can properly cool a process chamber adopted in the semiconductor manufacturing equipment such as a wafer etching device. The temperature control system for semiconductor manufacturing equipment includes a thermocline for cooling heat transfer fluid accommodated therein through a heat exchange with a heat exchanger and storing heat energy, a supply line for controlling the temperature of the heat transfer fluid in the thermocline through a heater and supplying the heat transfer fluid with a proper temperature to a process device, a recovery line for forwarding the heat transfer fluid having passed through the process device to the thermocline, and a bypass for forwarding a part of the heat transfer fluid passing through the recovery line to the supply line through the heater.
申请公布号 US2010206519(A1) 申请公布日期 2010.08.19
申请号 US20070738553 申请日期 2007.11.09
申请人 GLOBAL STANDARD TECHNOLOGY CO., LTD.;SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO BONG-HYUN;EUN CHANG-WOO;CHOI HYUN-SEOK;LEE SANG-GON;LEE KWANG-MYUNG;LEE IN-JOO;CHOI YONG-HO;AN SEONG-KUK;PARK CHOUL-OH
分类号 F28D15/00 主分类号 F28D15/00
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