发明名称 |
TEMPERATURE CONTROL SYSTEM FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT |
摘要 |
A temperature control system for semiconductor manufacturing equipment is disclosed, which can properly cool a process chamber adopted in the semiconductor manufacturing equipment such as a wafer etching device. The temperature control system for semiconductor manufacturing equipment includes a thermocline for cooling heat transfer fluid accommodated therein through a heat exchange with a heat exchanger and storing heat energy, a supply line for controlling the temperature of the heat transfer fluid in the thermocline through a heater and supplying the heat transfer fluid with a proper temperature to a process device, a recovery line for forwarding the heat transfer fluid having passed through the process device to the thermocline, and a bypass for forwarding a part of the heat transfer fluid passing through the recovery line to the supply line through the heater.
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申请公布号 |
US2010206519(A1) |
申请公布日期 |
2010.08.19 |
申请号 |
US20070738553 |
申请日期 |
2007.11.09 |
申请人 |
GLOBAL STANDARD TECHNOLOGY CO., LTD.;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO BONG-HYUN;EUN CHANG-WOO;CHOI HYUN-SEOK;LEE SANG-GON;LEE KWANG-MYUNG;LEE IN-JOO;CHOI YONG-HO;AN SEONG-KUK;PARK CHOUL-OH |
分类号 |
F28D15/00 |
主分类号 |
F28D15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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