PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME

摘要

The present invention relates to a photoactive compound of novel structure and a photosensitive resin composition containing the same. The photoactive compound according to the present invention has high sensitivity with efficient absorption of a UV light source by having a nitro group and a phosphonate structure. In addition, the photoactive compound has a residual film thickness, high mechanical strength, heat resistance, chemical resistance, and development resistance by improving solubility of a photosensitive resin composition through high compatibility with a binder resin and a phosphonate structure. Therefore, the photosensitive resin composition has an advantage of curing a material for column spacer, an overcoat, and the passivation of a liquid crystal display device, as well as high temperature process characteristics.