发明名称 WAVEFRONT ABERRATION MEASURING METHOD AND DEVICE THEREFOR
摘要 <p>When the wavefront aberration of a wide-angle lens the field of view of which is wide compared with the focal length is measured by means of a Shack-Hartmann sensor, the measurement is impossible because the inclination of the wavefront exceeds the inclination permissible value of the Shack-Hartmann sensor. A Shack-Hartmann sensor is inclined in the pupil position of a lens and is controlled so that the inclination of the wavefront is below the permissible value. Images are captured by a step-and-repeat method while the same positions are superposed on one another. The images are combined so that the superposition spots are superposed on one another. Thus, the wavefront aberration of the lens having a large pupil diameter is measured.</p>
申请公布号 WO2010092750(A1) 申请公布日期 2010.08.19
申请号 WO2010JP00345 申请日期 2010.01.22
申请人 HITACHI, LTD.;YOSHITAKE, YASUHIRO;YOSHIDA, MINORU;OKA, KEIKO 发明人 YOSHITAKE, YASUHIRO;YOSHIDA, MINORU;OKA, KEIKO
分类号 G01M11/02 主分类号 G01M11/02
代理机构 代理人
主权项
地址