发明名称 METHOD AND APPARATUS FOR TREATING EMISSION COMPRISING HALOGENATED ORGANIC COMPOUND
摘要 <p><P>PROBLEM TO BE SOLVED: To efficiently and economically treat a halogenated organic compound such as dichloromethane. <P>SOLUTION: An apparatus 10 for treating emission comprising a halogenated organic compound includes a scrubber column 14 that removes contaminant gas components other than halogenated organic compounds contained in emission, a gas-treatment column 24 including a microorganism layer 25 in which a decomposing microorganism decomposing a halogenated organic compound is carried by the carrier, a gas feeder 22 for feeding emission into the gas treatment column 24 from a lower part thereof, and a spray pipe 26 that sprays water onto the microorganism layer 25 from the upper part of the gas treatment column 24. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010179244(A) 申请公布日期 2010.08.19
申请号 JP20090025263 申请日期 2009.02.05
申请人 FUJIFILM CORP 发明人 MIYAZAKI HIDEO;MORITA KIYOSHI
分类号 B01D53/70;B01D53/34;B01D53/72;B01D53/77 主分类号 B01D53/70
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