METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE AND NEGATIVE PHOTORESIST COMPOSITION USED THEREIN

摘要

PURPOSE: A negative photoresist composition, and a manufacturing method of a thin film transistor array panel using thereof are provided to reduce the pattern deformation of the thin film transistor array panel, and to improve the heat resistance and uniformity of the composition. CONSTITUTION: A manufacturing method of a thin film transistor array panel comprises the following steps: forming a conductive layer formed with a conductive material on a substrate; forming an etching pattern formed with a negative photoresist composition; and forming a conductive pattern by etching the conductive layer using the etching pattern as a mask. The negative photoresist composition contains 10~50 parts of novolac resin by weight, 0.5~10 parts of first photoacid generator by weight marked with chemical formula 1, 0.5~10 parts of second photoacid generator by weight marked with chemical formula 2, 1~20 parts of cross-linking agent by weight, and 10~90 parts of solvent by weight.