| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve a short-dimensional correction region in a color filter masking process. <P>SOLUTION: First, a change region map indicating, by line widths and the coordinates, change quantity in relation to a design value caused by process properties of the color filter. Then, the change quantity is corrected based on the change region map for an initial design value of the photomask for the color filter. Next, when the change quantity is corrected for the photomask, the change quantity from a region where a change in the short-dimensional correction region is large to a region where the change is small in the change region map is corrected for the initial design value of the photomask. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
