| 摘要 |
PROBLEM TO BE SOLVED: To achieve a defect inspection apparatus for detecting a defect exciting at the edge of a semiconductor wafer, and observing the detected defect. SOLUTION: The defect inspection apparatus includes: first defect inspecting illumination optical systems 10a-10b for illuminating the edge of the semiconductor wafer 1 at a plurality of different angles; second illumination optical systems 16a-16b for emitting an observation illumination light to the edge of the semiconductor wafer; and an objective lens 12 for collecting a scattered light emitted from the edge of the semiconductor wafer during a defect inspection, and collecting a positive reflection light emitted from the edge of the semiconductor wafer during an observation. The scattered light collected by the objective lens is received by a light detection means 15. The positive reflection light collected by the objective lens is received by an image capturing apparatus 19. Output signals from the light detection means and the image capturing apparatus are supplied to a signal processor 5 generate to a defect detection signal, and to output a two-dimensional image signal of the edge of the semiconductor wafer. COPYRIGHT: (C)2010,JPO&INPIT |
