| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material, forming a white resist film having high reflectance, and hardly discoloring from white due to high temperature and irradiation of light. <P>SOLUTION: This resist material contains: at least one of polymerizable hydrocarbon monomer and polymerizable hydrocarbon polymer; a white filler; and a photopolymerization initiating component which is a photopolymerization initiator or a combination of a photopolymerization initiator and a sensitizer. The polymerizable hydrocarbon polymer contains epoxy resin, and the polymerizable hydrocarbon monomer and the epoxy resin have a mol absorption coefficient of 1M<SP>-1</SP>cm<SP>-1</SP>or less at a wavelength of 400 nm, and after baking at 270°C for one hour, the polymerizable hydrocarbon monomer and epoxy resin have a mol absorption coefficient of 5M<SP>-1</SP>cm<SP>-1</SP>or less at a wavelength of 400 nm. The wavelength X at an absorption wavelength end at the long wavelength side of the filler is 450 nm or less, and the mol absorption coefficient of the photopolymerization initiating component at a wavelength of (X+10) nm is 5M<SP>-1</SP>cm<SP>-1</SP>or more. <P>COPYRIGHT: (C)2010,JPO&INPIT |
