发明名称 GASIFIED GAS CLEANING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a gasified gas cleaning method increasing a yield of hydrogen, and its apparatus. SOLUTION: In the gasified gas cleaning method, a gasified gas from a gasification furnace 1 is oxidized/reformed by an oxidization/reforming furnace 2, the reformed gasified gas is cooled by a heat exchanger 4 to recover heat, and the gasified gas after cooling is cooled by a cooling unit 5 to condensate a water vapor remained in the gasified gas. The cooled gasified gas is pressurized by a booster 7 and the pressurized gasified gas is treated by a CO<SB>2</SB>absorption apparatus 10 to take out CO. The CO taken out by the CO<SB>2</SB>absorption apparatus 10 is returned to a downstream side of the gasification furnace 1, a shift reaction is performed relative to the CO and the water vapor of the gasified gas to convert it to hydrogen, and the hydrogen is further separated from the gasified gas by a hydrogen separation membrane arranged in a downstream side. COPYRIGHT: (C)2010,JPO&amp;INPIT
申请公布号 JP2010180259(A) 申请公布日期 2010.08.19
申请号 JP20090022124 申请日期 2009.02.03
申请人 IHI CORP 发明人 OHARA HIROAKI;MATSUZAWA KATSUAKI;HAMADA YUKITAKA
分类号 C10K3/00;C10K3/04 主分类号 C10K3/00
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