APPARATUS AND METHOD FOR CLEANING SUBSTRAE

摘要

PURPOSE: A method and a device for cleaning a substrate are provided to more effectively clean a foreign material on a substrate. CONSTITUTION: A substrate conveying unit(110) transmits a substrate to a first direction. A cleaning units(220a,220b) are provides on moving path of the substrate transmitted by the moving unit. The cleaning unit pressurizes a rotating cleaning head on the substrate. The cleaning unit removes a foreign material on the substrate. The cleaning head includes a cleaning pad and a holder.