| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of effectively preventing the degradation of polishing characteristics due to penetration of slurry, and a manufacturing method of the polishing pad. <P>SOLUTION: A cushion layer 30 to which a water repellent treatment is not performed is immersed in water repellent treatment liquid and dried / cured to form a cushion layer 3, and the cushion layer 3 and a polishing layer 2 stuck together with a double coated tape 2a are turned to the polishing pad 1. The water repellent treatment liquid contains a water repellent, a penetrant and water. The water repellent is an oligomer or a polymer containing at least either of silicon and fluorine as a constituting element, and the penetrant contains at least either of a compatibility accelerator such as alcohols or glycol and a surfactant. The concentration of the water repellent is 0.02 wt% to 50 wt%, 0.1 wt% to 10 wt% desirably. The concentration of the penetrant is 0.01 wt% to 60 wt%, 15 wt% to 30 wt% desirably. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
