发明名称 Illumination system for use in a stereolithography apparatus
摘要 <p>An illumination system (30), comprising: - a plurality of light-emitting diodes (LEDs) (34), each LED having at least a first, light-emitting surface (36) and a second surface (37), at least one of the first and the second surface being substantially flat; - a plurality of electrical pathways (56), selectively connected to the respective LEDs, such that each LED can be individually controlled; and - a levelling surface (46, 52), wherein the levelling surface is substantially flat and in levelling contact with the at least one substantially flat surface (37, 36) of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the levelling surface.</p>
申请公布号 EP2218571(A1) 申请公布日期 2010.08.18
申请号 EP20090151794 申请日期 2009.01.30
申请人 NEDERLANDSE ORGANISATIE VOOR TOEGEPAST -NATUURWETENSCHAPPELIJK ONDERZOEK TNO 发明人 VAES, MARK HERMAN ELSE;MAALDERINK, HERMAN HENDRIKUS;VERMEER, ADRIANUS JOHANNES PETRUS MARIA;JAMAR, JACOBUS HUBERTUS THEODOR;LOMMEN, ANTONIUS HUBERTUS JOANNES GERARDUS;RIJFERS, ANDRIES
分类号 B29C67/00 主分类号 B29C67/00
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