发明名称 |
Illumination system for use in a stereolithography apparatus |
摘要 |
<p>An illumination system (30), comprising:
- a plurality of light-emitting diodes (LEDs) (34), each LED having at least a first, light-emitting surface (36) and a second surface (37), at least one of the first and the second surface being substantially flat;
- a plurality of electrical pathways (56), selectively connected to the respective LEDs, such that each LED can be individually controlled; and
- a levelling surface (46, 52),
wherein the levelling surface is substantially flat and in levelling contact with the at least one substantially flat surface (37, 36) of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the levelling surface.</p> |
申请公布号 |
EP2218571(A1) |
申请公布日期 |
2010.08.18 |
申请号 |
EP20090151794 |
申请日期 |
2009.01.30 |
申请人 |
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST -NATUURWETENSCHAPPELIJK ONDERZOEK TNO |
发明人 |
VAES, MARK HERMAN ELSE;MAALDERINK, HERMAN HENDRIKUS;VERMEER, ADRIANUS JOHANNES PETRUS MARIA;JAMAR, JACOBUS HUBERTUS THEODOR;LOMMEN, ANTONIUS HUBERTUS JOANNES GERARDUS;RIJFERS, ANDRIES |
分类号 |
B29C67/00 |
主分类号 |
B29C67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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