发明名称 |
Small lot size lithography bays |
摘要 |
In a first aspect, a small lot size lithography bay is provided. The small lot size lithography bay includes (1) a plurality of lithography tools; and (2) a small lot size transport system adapted to transport small lot size substrate carriers to the lithography tools. Each small lot size substrate carrier is adapted to hold fewer than 13 substrates. Numerous other aspects are provided.
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申请公布号 |
US7778721(B2) |
申请公布日期 |
2010.08.17 |
申请号 |
US20050148956 |
申请日期 |
2005.06.09 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ENGLHARDT ERIC ANDREW;SHAH VINAY |
分类号 |
G06F19/00;H01L21/00;H01L21/677 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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