发明名称 Small lot size lithography bays
摘要 In a first aspect, a small lot size lithography bay is provided. The small lot size lithography bay includes (1) a plurality of lithography tools; and (2) a small lot size transport system adapted to transport small lot size substrate carriers to the lithography tools. Each small lot size substrate carrier is adapted to hold fewer than 13 substrates. Numerous other aspects are provided.
申请公布号 US7778721(B2) 申请公布日期 2010.08.17
申请号 US20050148956 申请日期 2005.06.09
申请人 APPLIED MATERIALS, INC. 发明人 ENGLHARDT ERIC ANDREW;SHAH VINAY
分类号 G06F19/00;H01L21/00;H01L21/677 主分类号 G06F19/00
代理机构 代理人
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