| 摘要 |
Disclosed are via, a method for formation of via using zinc and zinc alloys, and a process for fabrication of three-dimensional multiple chip stack packages by using the same. In lamination of three-dimensional chips, the chips with reduced defects are rapidly formed by the steps of: punching each of the chips to form a via hole used for a circuit wiring between the chips; depositing a seed layer on an inside of the via hole; forming a plated layer inside the via hole by using Zn and Zn alloys through an electroplating process; removing oxide film from surface of the plated layer; and heat treating the via hole at a temperature of more than melting point of the Zn and Zn alloys. Particularly, the chip having Zn via formed according to the present invention has an advantage of simultaneously overcoming problems in establishment of processing parameters caused by Cu via (e.g., plating mode, current density, influence of additives, pore formation, etc.), problems in successive processes caused by Sn (and other low melting point metals) via (e.g., soldering, chip stack, etc.) and difficulty in mechanical reliability of the process. Additionally, when stacking multiple chips with various functions in the three-dimensional chip stack package, the package can be simply fabricated by controlling contents of constitutional elements in Zn alloy via which has specific thermal properties (such as melting point, thermal expansion coefficient, etc.) suitable for processing temperature of each of the chips. |
