发明名称 Transistor, method of manufacturing same, etchant for use during manufacture of same, and system containing same
摘要 A transistor comprises a gate (110) comprising a gate electrode (111) and a gate dielectric (112), an electrically insulating cap (120, 720) over the gate, and a source/drain contact (130) adjacent to the gate. The electrically insulating cap prevents electrical contact between the gate and the source/drain contact. In one embodiment, the electrically insulating cap is formed in a trench (160, 660) that is self-aligned to the gate and that is created by the removal of a sacrificial cap using an aqueous solution comprising a carboxylic acid and a corrosion inhibitor.
申请公布号 US7776729(B2) 申请公布日期 2010.08.17
申请号 US20060607549 申请日期 2006.11.30
申请人 INTEL CORPORATION 发明人 RACHMADY WILLY;RAMACHANDRARAO VIJAY;GOLONZKA OLEG;FAJARDO ARNEL M.
分类号 H01L21/3205 主分类号 H01L21/3205
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