发明名称 |
MANUFACTURING PROCESS OF HIGH-PURITY TRIS(TRIMETHYLSILYL) PHOSPHATE |
摘要 |
PURPOSE: A method for preparing Tris(trimethylsilyl)phosphate is provided to obtain Tris(trimethylsilyl) phosphate of high purity at low temperature without solvent. CONSTITUTION: A method for preparing Tris(trimethylsilyl)phosphate comprises: a step of reacting phosphoric acid, hexamethyldisilazaen, quaternary ammonium salt, phosphonium salt and mixture thereof at 100-160°C for 5-20 hours to obtain crude Tris(trimethylsilyl)phosphate; and a step of purifying the crude Tris(trimethylsilyl)phosphate.
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申请公布号 |
KR20100090150(A) |
申请公布日期 |
2010.08.13 |
申请号 |
KR20090009468 |
申请日期 |
2009.02.05 |
申请人 |
LEECHEM CO., LTD. |
发明人 |
KWON, YOUNG GIL;OH, SOON TAE;SUNG, MIN TAE;PARK, SANG JUNG |
分类号 |
C07F9/09;C07F7/08 |
主分类号 |
C07F9/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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