| 摘要 |
PURPOSE: A heat treatment device is provided to prevent damage to a processing substrate due to the attachment of sublimate to the inner side of a shutter. CONSTITUTION: A heat treatment device comprises a furnace, a shutter(2), a heater(4), and a pressure regulating unit. The furnace comprises an opening for loading or unloading a processing substrate. The shutter including multiple shutter members opens and closes the opening. The heater is installed in the shutter and heats the shutter when the opening opens. The pressure regulating unit controls the interior pressure of the furnace with respect to the exterior pressure of the furnace. |
