发明名称 |
Method of Producing a Partly or Completely Semi-Insulating or P-Type Doped ZnO Substrate, Substrates Obtained, and Electronic, Electro-Optic or Optoelectronic Devices Comprising Them |
摘要 |
Method of producing a partly or completely semi-insulating or p-type doped ZnO substrate from an n-type doped ZnO substrate, in which the n-type doped ZnO substrate is brought into contact with an anhydrous molten salt chosen from anhydrous molten sodium nitrate, lithium nitrate, potassium nitrate and rubidium nitrate. Partly or completely semi-insulating or p-type doped ZnO substrate, said substrate being in particular in the form of a thin layer, film or in the form of nanowires ; and said substrate being doped at the same time by an element chosen from Na, Li, K and Rb; by N; and by O; it being furthermore possible for ZnO or GaN to be epitaxially grown on this substrate. Electronic, optoelectronic or electro-optic device such as a light-emitting diode (LED) comprising this substrate.
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申请公布号 |
US2010200850(A1) |
申请公布日期 |
2010.08.12 |
申请号 |
US20090536897 |
申请日期 |
2009.08.06 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
COUCHAUD MAURICE;CHEVALIER CELINE |
分类号 |
H01L33/02;H01L21/04;H01L29/02;H01L29/12 |
主分类号 |
H01L33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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