| 摘要 |
PURPOSE: A plasma enhanced chemical vapor deposition apparatus is provided to improve the flatness of a discharge electrode unit by filling an insulating material between electrodes of the discharge electrode unit. CONSTITUTION: A discharge electrode unit(110) comprises a flat rear panel(160), a front panel, an upper panel(181), and a lower panel(182). The rear panel is formed with an insulating material. The front panel includes first and second electrodes(11a,116) which are arranged on a flat insulating layer and are spaced apart from each other by a specific interval. A plurality of first and second electrodes are extended in a longitudinal direction. The flatness of the front panel is improved by using insulating material to fill the area between the first and second electrodes.
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