| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently perform exposure even for a long sheet-like photosensitive object with flexibility, for instance. <P>SOLUTION: An exposure method for exposing a plate through a mask includes exposing a first region of the plate P by reciprocating the mask M along the scanning direction, and moving the mask M and the plate P synchronously while exposing the plate P through a pattern of the mask M and a first projection optical system PLA in a first period during the reciprocating movement of the mask M; and exposing a second region of the plate P by moving the mask M and the plate P synchronously while exposing the plate P through the pattern of the mask M and a second projection optical system PLB in a second period during the reciprocating movement of the mask M. <P>COPYRIGHT: (C)2010,JPO&INPIT |
