| 发明名称 |
APPARATUS AND METHOD FOR DETERMINISTIC CONTROL OF SURFACE CONFIGURATION DURING FULL APERTURE POLISHING |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide apparatus and method for creating a deterministic polishing process with respect to an optical surface. <P>SOLUTION: The computerized method for calculating the amount of material removed from a workpiece during the polishing process in a polishing system includes receiving a pair of polishing characteristics; calculating a pair of kinematic characteristics with respect to a lap and the workpiece; calculating an exposure time with respect to a couple of lap points; calculating friction force between the lap and the workpiece; calculating inclination between the lap and the workpiece; calculating pressure distribution between the lap and the workpiece; calculating cumulative pressure distribution between the lap and the workpice; and calculating the amount of material removed from the workpiece. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010173066(A) |
申请公布日期 |
2010.08.12 |
| 申请号 |
JP20100019742 |
申请日期 |
2010.01.29 |
| 申请人 |
LAWRENCE LIVERMORE NATIONAL SECURITY LLC |
发明人 |
SURATWALA TAYYAB ISHAQ;FEIT MICHAEL DENNIS;STEELE WILLIAM AUGUSTUS |
| 分类号 |
B24B37/04 |
主分类号 |
B24B37/04 |
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