| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dressing apparatus for dressing a polishing pad without generating too much uneven wear, and reducing dressing load. <P>SOLUTION: The dressing apparatus includes a dressing member 42 having a dressing face abutting to the polishing pad 10 to slide freely, a dresser drive shaft 32 rotatable and vertically movable, dresser flanges 41A, 41B coupled to the dresser drive shaft 32 and configured to secure the dressing member 42 thereto, a spherical bearing 45 provided in the dresser flanges 41A, 41B and configured to allow the dressing member 42 to tilt with respect to the dresser drive shaft 32, and a spring mechanism 49 configured to generate a force against tilting motion of the dressing member 42. <P>COPYRIGHT: (C)2010,JPO&INPIT |
