| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a hard coating film more excellent in wear resistance than a TiN coating film and a TiAlN coating film, which are conventional hard coating films, and to provide a sputtering target material for forming the hard coating film. <P>SOLUTION: [1] The hard coating film is represented by (Zr<SB>1-a-b</SB>, Hf<SB>a</SB>, M<SB>b</SB>)(C<SB>1-x</SB>N<SB>x</SB>) (wherein M denotes one or more of W and Mo), wherein 0≤1-a-b, 0≤a, 0.03≤b≤0.35 and 0≤x≤1 are satisfied. [2] The hard coating film is represented by (Zr<SB>1-a-b-c</SB>, Hf<SB>a</SB>, M<SB>b</SB>, D<SB>c</SB>)(C<SB>1-x</SB>N<SB>x</SB>) (wherein D denotes one or more of Si and B), wherein 0≤1-a-b, 0≤a, 0.03≤b≤0.35, 0.03≤c≤0.3, and 0≤x≤1 are satisfied and the like are provided, wherein a, b, c and x denote atomic ratios of Hf, M, D and N, respectively. <P>COPYRIGHT: (C)2010,JPO&INPIT |
