| 发明名称 |
ALKALINE POST-CHEMICAL MECHANICAL PLANARIZATION CLEANING COMPOSITIONS |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning composition used after CMP, and to provide a method including the same. Ž<P>SOLUTION: This cleaning composition contains water, an organic base, and a plurality of chelating agents including an amino polycarboxylic acid and a hydroxylcarboxylic acid, wherein the composition has a pH in a range of 9.5 to 11.5. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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| 申请公布号 |
JP2010177702(A) |
申请公布日期 |
2010.08.12 |
| 申请号 |
JP20100094048 |
申请日期 |
2010.04.15 |
| 申请人 |
AIR PRODUCTS & CHEMICALS INC |
发明人 |
CHANDRAKANT TAMBOLI DNYANESH;BANERJEE GAUTAM |
| 分类号 |
C11D3/26;H01L21/304;C11D3/20;C11D3/30;C11D3/33;C11D3/34;C11D7/26;C11D7/32;C11D11/00;C23G5/024;C23G5/036;H01L21/02;H01L21/306 |
主分类号 |
C11D3/26 |
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