| 摘要 |
PURPOSE: An apparatus for controlling a multi-electrode and a plasma processing system are provided to adjust the distribution ratio of power, applied to each electrode, by detecting the change of impedance of each electrode. CONSTITUTION: A plurality of electrodes(110a, 110b, 110c, 110d, 110e, 110f) is prepared in a chamber. A radio-frequency(RF) generator(330) supplies RF power to the electrodes. A plurality of power controlling units(350a, 350b, 350c, 350d, 350e, 350f) is respectively connected with the electrodes to obtain constant power. A matching unit(320) is connected between the power controlling unit and the RF generator. The matching unit performs an impedance matching operation between the RF generator and the electrodes. |
