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发明名称
Vorrichtung und Verfahren zum thermischen Behandeln von Halbleiterwafern
摘要
申请公布号
DE10236896(B4)
申请公布日期
2010.08.12
申请号
DE20021036896
申请日期
2002.08.12
申请人
MATTSON THERMAL PRODUCTS GMBH;QIMONDA AG
发明人
ROTERS, GEORG;FRIGGE, STEFFEN;TAY, SING PIN;HU, YAO ZHI;HAYN, REGINA;SACHSE, JENS-UWE;SCHOER, ERWIN;KEGEL, WILHELM
分类号
H01L21/324;H01L21/00;H01L21/28;H01L21/316;H01L21/321;H01L21/336
主分类号
H01L21/324
代理机构
代理人
主权项
地址
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