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发明名称
Prozess zum Herstellen einer siliziumhaltigen Beschichtung, siliziumhaltige Beschichtung und Halbleitervorrichtung
摘要
申请公布号
DE112007003638(T5)
申请公布日期
2010.08.12
申请号
DE20071103638T
申请日期
2007.09.10
申请人
FUJITSU LTD.
发明人
KOBAYASHI, YASUSHI;YOSHIKAWA, KOUTA;NAKATA, YOSHIHIRO;IMADA, TADAHIRO;OZAKI, SHIROU
分类号
H01L21/312;H01L21/3205;H01L21/768;H01L23/52;H01L23/522
主分类号
H01L21/312
代理机构
代理人
主权项
地址
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