发明名称 INSPECTION APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND INSPECTION METHOD.
摘要 <p>For angular resolved spectrometry a radiation beam with an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.</p>
申请公布号 NL2004094(A) 申请公布日期 2010.08.12
申请号 NL20102004094 申请日期 2010.01.14
申请人 ASML NETHERLANDS B.V., 发明人 CRAMER, HUGO;KIERS, ANTOINE;PELLEMANS, HENRICUS
分类号 G01N21/47;G03F7/20 主分类号 G01N21/47
代理机构 代理人
主权项
地址