| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which can suppress the remaining of a liquid on an object. <P>SOLUTION: The exposure apparatus comprises: an optical system, which has an emergent surface wherefrom exposure light emerges; a first surface, which is disposed at least partly around an optical path of the exposure light from the emergent surface; a second surface, which is disposed at least partly around the first surface; and a first supply port, which is disposed at least partly around the first surface such that it faces in an outward radial direction with respect to an optical axis of the projection optical system, which supplies a first liquid to the second surface; wherein, during at least part of exposure of a substrate, a front surface of the substrate opposes the emergent surface, the first surface, and the second surface; and the substrate is exposed with the exposure light that emerges from the emergent surface and transits a second liquid between the emergent surface and the surface of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
