| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate transfer device including a means which reduces defects of a coating film applied to a substrate surface such as the deformation and waving of the coating film, and the deposition of foreign matters to a surface of the coating film which are caused by wind generated during the high-speed transfer of the substrate. Ž<P>SOLUTION: The substrate transfer device having a hand for loading and holding the substrate has an air diffusion plate covering the substrate loaded in the hand portion from above, and the air diffusion plate has one end fixed to a root of the hand. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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