CONDUCTIVE PATTERN AND MANUFACTURING METHOD THEREOF

摘要

The present invention provides a method for manufacturing a conductive pattern, and the conductive pattern manufactured by the same. The method comprises the steps of: a) forming a conductive film on a substrate; b) forming an etching resist patter on the conductive film; and c) over-etching the conductive film by using the etching resist pattern in order to form the conductive pattern having a line width narrower than the etching resist pattern. The invention is able to efficiently and economically provide the conductive pattern having an ultra-fine line width.