| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device manufacturing method, seal structure, a method of removing an object and a method of sealing. <P>SOLUTION: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed, and in an embodiment, reduces transmission of forces between the different parts. <P>COPYRIGHT: (C)2010,JPO&INPIT |
