发明名称 SURFACE TREATMENT DEVICE AND SURFACE TREATMENT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface treatment device which is capable of locally planarizing a thinned substrate and can be miniaturized and simplified. <P>SOLUTION: The surface treatment device includes a nozzle 3 having a jet outlet 33a for injecting a treatment liquid for etching and an intake 34a for sucking the treatment liquid injected from the jet outlet 33a. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010177424(A) 申请公布日期 2010.08.12
申请号 JP20090018108 申请日期 2009.01.29
申请人 SEIKO EPSON CORP 发明人 NISHIJIMA TATSUMI
分类号 H01L21/306;H01L41/18;H01L41/22;H01L41/332 主分类号 H01L21/306
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